Inventor
Markku Leskelä
Inventor
Espoo, FI
Overview
Patents· 64 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H01LSemiconductor devices10%
D21HPulp compositions6%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium5%
H10NElectric solid-state devices not otherwise provided for5%
H10DInorganic electric semiconductor devices4%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
C30BSingle-crystal growth3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
11,072,622Synthesis and use of precursors for ALD of tellurium and selenium thin films202111,047,046Vapor deposition of thin films comprising gold202111,047,042Synthesis and use of precursors for ALD of molybdenum or tungsten containing thin films202111,014,866Synthesis and use of precursors for vapor deposition of tungsten containing thin films202110,941,487Synthesis and use of precursors for ALD of group VA element containing thin films202110,847,366Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process202010,741,403Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures202010,731,249Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus202010,734,223Method for depositing a metal chalcogenide on a substrate by cyclical deposition202010,619,244Synthesis and use of precursors for ALD of group VA element containing thin films202010,619,242Atomic layer deposition of rhenium containing thin films202010,468,261Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures201910,468,262Methods for forming a metallic film on a substrate by a cyclical deposition and related semiconductor device structures201910,358,407Synthesis and use of precursors for vapor deposition of tungsten containing thin films201910,344,378Precursors and methods for atomic layer deposition of transition metal oxides201910,319,588Method for depositing a metal chalcogenide on a substrate by cyclical deposition201910,308,673Synthesis and use of precursors for ALD of tellurium and selenium thin films201910,208,379Synthesis and use of precursors for ALD of group VA element containing thin films201910,145,009Vapor deposition of thin films comprising gold20189,909,211'Vapor deposition of LiF thin films'20189,878,516'Metamaterial thin films'20189,828,674Synthesis and use of precursors for ALD of group VA element containing thin films20179,783,563'Synthesis and use of precursors for ALD of tellurium and selenium thin films'20179,765,431'Atomic layer deposition of metal phosphates and lithium silicates'20179,677,173'Precursors and methods for atomic layer deposition of transition metal oxides'20179,646,820'Methods for forming conductive titanium oxide thin films'20179,394,609'Atomic layer deposition of aluminum fluoride thin films'20169,382,615'Vapor deposition of LiF thin films'20169,365,926'Precursors and methods for atomic layer deposition of transition metal oxides'20169,315,896'Synthesis and use of precursors for ALD of group VA element containing thin films'20169,315,894'Atomic layer deposition of metal phosphates and lithium silicates'20169,223,203'Microcontact printed films as an activation layer for selective atomic layer deposition'20159,175,390'Synthesis and use of precursors for ALD of tellurium and selenium thin films'20159,169,557'Process for producing oxide films'20158,945,675'Methods for forming conductive titanium oxide thin films'20158,764,936'Process for producing mechanical pulp suitable for paper or cardboard making'20148,685,165'Metal oxide films'20148,608,905'Method for producing fiber product'20138,372,483'Methods for forming thin films comprising tellurium'20137,713,584'Process for producing oxide films'20107,618,681'Process for producing bismuth-containing oxide films'20097,498,272'Method of depositing rare earth oxide thin films'20097,377,976'Method for growing thin oxide films'20087,220,451'Process for producing metal thin films by ALD'20077,108,747'Method for growing oxide thin films containing barium and strontium'20066,932,867'Method for growing thin oxide films'20056,908,531'Calendered paper product and method of producing a calendered paper web'20056,893,536'Process and coating composition for coating a paper web'20056,893,789'Method of producing printed matter'20056,858,546'Method of depositing rare earth oxide thin films'20056,824,816'Process for producing metal thin films by ALD'20046,773,550'Method for coating webs'20046,706,115'Method for preparing metal nitride thin films'20046,632,279'Method for growing thin oxide films'20036,599,391'Filler for use in paper manufacture and procedure for producing a filler'20036,436,238'Process for preparing a paper web'20026,436,232'Procedure for adding a filler into a pulp based on cellulose fibers'20026,416,577'Method for coating inner surfaces of equipment'20026,406,592'Process for preparing base paper for fine paper'20026,391,154'Paper web and a method for the production thereof'20026,375,794'Filler for use in paper manufacture and procedure for producing a filler'20026,362,356'Metallocene compounds for the polymerization of ethylenically unsaturated monomers'20026,251,222'Filler for use in paper manufacture and procedure for producing a filler'20015,296,437'Catalyst for metathesis reactions of olefines and a method for preparing it as well as the metathesis reaction concerned'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2021Based in Espoo, FI· patent location history
2001–2014Based in Lohja, FI· patent location history
2002–2014Patents assigned to M REAL OYJ (9)· patent assignee history
2004–2016Patents assigned to ASM INT (15)· patent assignee history
2005–2013Based in Muijala, FI· patent location history
2008–2018Patents assigned to RITALA MIKKO (10)· patent assignee history
2016–2021Patents assigned to ASM IP HOLDING BV (23)· patent assignee history
2017–2021Patents assigned to ASM INT NV (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASM IP HOLDING BV | 23 | 2016–2021 |
| ASM INT | 15 | 2004–2016 |
| RITALA MIKKO | 10 | 2008–2018 |
| M REAL OYJ | 9 | 2002–2014 |
| ASM INT NV | 6 | 2017–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Espoo, FI | 51 | 1994–2021 |
| Lohja, FI | 9 | 2001–2014 |
| Muijala, FI | 4 | 2005–2013 |