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Inventor

Zachary J. DEVEREAUX

Inventor
US

Overview

3→
Patents
2025–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material43%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium14%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
PatentTitleYear
12,571,100Atomic layer deposition of molybdenum silicide thin films202612,435,411Metal organonitrile precursors for thin film deposition202512,438,050Electronic device fabrication using area-selective deposition2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2025–2026Patents assigned to UNIV WAYNE STATE (2)· patent assignee history
2025–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC32025–2026
UNIV WAYNE STATE22025–2026
Locations
LocationPatentsSpan
US32025–2026