Inventor
Kiho Hwang
Inventor
Seoul, KR
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Fprimary
H01FMagnets25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10DInorganic electric semiconductor devices17%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
11,127,596Semiconductor material growth of a high resistivity nitride buffer layer using ion implantation202111,101,378Semiconductor structure having both enhancement mode group III-N high electron mobility transistors and depletion mode group III-N high electron mobility transistors20219,691,618'Methods of fabricating semiconductor devices including performing an atomic layer etching process'20178,866,577'Coil component'20148,791,786'Coil device'20148,779,883'Coil device'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014Patents assigned to TDK CORP (3)· patent assignee history
2014Patents assigned to TDK KOREA CORP (3)· patent assignee history
2014Patents assigned to HWANG KIHO (2)· patent assignee history
2014Patents assigned to KOBAYASHI KATSUMI (2)· patent assignee history
2014Patents assigned to MAEDA HIROSHI (2)· patent assignee history
2014–2017Based in Seoul, KR· patent location history
2021Based in Amherst, NH, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TDK CORP | 3 | 2014 |
| TDK KOREA CORP | 3 | 2014 |
| HWANG KIHOself | 2 | 2014 |
| KOBAYASHI KATSUMI | 2 | 2014 |
| MAEDA HIROSHI | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 4 | 2014–2017 |
| Amherst, NH, US | 2 | 2021 |