Inventor
Po-Hsueh Li
Inventor
Taichung, TW
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices39%
H10DInorganic electric semiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
PatentTitleYear
11,018,275Method of creating CIGS photodiode for image sensor applications202110,727,061Method for integrated circuit patterning202010,269,906Semiconductor device having two spacers201910,163,718Semiconductor device and a method for fabricating the same20189,941,125Method for integrated circuit patterning20189,779,997'Semiconductor device and a method for fabricating the same'20179,536,980'Gate spacers and methods of forming same'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (6)· patent assignee history
2017–2020Based in Taichung, TW· patent location history
2021Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2021Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 6 | 2017–2020 |
| APPLIED MATERIALS INC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taichung, TW | 6 | 2017–2020 |
| San Jose, California, US | 1 | 2021 |