Inventor
Maria Ronay
Inventor
Briarcliff Manor, NY, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
C09GPolishing compositions10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
C22CAlloys7%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys7%
B24BMachines, devices, or processes for grinding or polishing2%
C11DDetergent compositions2%
C12NMicroorganisms or enzymes2%
PatentTitleYear
7,694,871'Self-encapsulated silver alloys for interconnects'20107,527,188'Self-encapsulated silver alloys for interconnects'20097,189,292'Self-encapsulated silver alloys for interconnects'20076,964,923'Selective polishing with slurries containing polyelectrolytes'20056,840,009'Sliding window structure with sash guiding tracks'20056,824,579'Selective polishing with slurries containing polyelectrolytes'20046,641,632'Polishing compositions and use thereof'20036,413,866'Method of forming a solute-enriched layer in a substrate surface and article formed thereby'20026,238,469'Dual-valent rare earth additives to polishing slurries'20016,227,658'Apparatus and method for forming thin film using ink-jet mechanism'20016,110,396'Dual-valent rare earth additives to polishing slurries'20005,994,241'Method of forming conductive lines on a semiconductor wafer'19995,972,787'CMP process using indicator areas to determine endpoint'19995,968,280'Method for cleaning a surface'19995,876,490'Polish process and slurry for planarization'19995,752,875'Method of chemically-mechanically polishing an electronic component'19984,526,629'Catalytic oxidation of solid materials'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2010Patents assigned to IBM (15)· patent assignee history
1985–2007Based in Briarcliff Manor, NY, US· patent location history
2001Patents assigned to TOSHIBA KK (1)· patent assignee history
2002Based in Pelham Manor, NY, US· patent location history
2009–2010Based in San Francisco, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 15 | 1985–2010 |
| TOSHIBA KK | 1 | 2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Briarcliff Manor, New York, US | 14 | 1985–2007 |
| San Francisco, California, US | 2 | 2009–2010 |
| Pelham Manor, New York, US | 1 | 2002 |