Inventor
Minoru Watanuki
Inventor
Tokyo, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
H05KPrinted circuits32%
G02BOptical elements, systems or apparatus11%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
F21VFunctional features or details of lighting devices or systems thereof5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light5%
PatentTitleYear
5,606,172'Exposing apparatus and exposing method of works'19975,258,808'Exposure apparatus for forming image'19935,185,625'Exposure apparatus for forming pattern on printed-wiring board'19935,168,302'Apparatus for permeating irradiated light'19925,150,253'Reflective mirror having cooling unit attached thereto'19925,147,130'Cooling liquid recirculation system for light source unit'19925,119,127'Photoresist exposure method and apparatus therefor'19925,037,722'Photoresist exposure method and apparatus therefor'19914,973,850'Variable incident angle exposure apparatus'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–1997Patents assigned to ORC MFG CO LTD (9)· patent assignee history
1990–1993Based in Tokyo, JP· patent location history
1997Based in Choufu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ORC MFG CO LTD | 9 | 1990–1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 8 | 1990–1993 |
| Choufu, JP | 1 | 1997 |