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Inventor

Daniel Byun

Inventor
Campbell, CA, US

Overview

2→
Patents
2014–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
C04BLime, magnesia17%
C23CCoating metallic material17%
H01JElectric discharge tubes or discharge lamps17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
PatentTitleYear
10,745,805Plasma resistant coating of porous body by atomic layer deposition20208,797,705'Methods and arrangement for plasma dechuck optimization based on coupling of plasma signaling to substrate position and potential'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014Patents assigned to BYUN DANIEL (1)· patent assignee history
2014Patents assigned to LAM RES CORP (1)· patent assignee history
2014Patents assigned to MAKHRATCHEV KONSTANTIN (1)· patent assignee history
2014Patents assigned to SANTOS ED (1)· patent assignee history
2014Based in Newark, CA, US· patent location history
2020Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2020Based in Campbell, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC12020
BYUN DANIELself12014
LAM RES CORP12014
MAKHRATCHEV KONSTANTIN12014
SANTOS ED12014
Locations
LocationPatentsSpan
Campbell, California, US12020
Newark, California, US12014