Inventor
Yool Kang
Inventor
Yongin-si, KR
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H01LSemiconductor devices9%
H10BElectronic memory devices9%
H10DInorganic electric semiconductor devices9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B05DProcesses for applying fluent materials to surfaces, in general1%
B82YSpecific uses or applications of nanostructures1%
C07CAcyclic or carbocyclic compounds1%
PatentTitleYear
10,712,662Methods of forming patterns using compositions for an underlayer of photoresist202010,236,185Method of forming patterns for semiconductor device20199,892,915'Hard mask composition, carbon nanotube layer structure, pattern forming method, and manufacturing method of semiconductor device'20189,613,821'Method of forming patterns and method of manufacturing integrated circuit device'20179,337,032'Method of forming pattern of semiconductor device'20168,987,118'Method of fabricating semiconductor device'20158,778,598'Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion'20148,735,053'Methods of forming photoresist patterns'20148,623,739'Method of manufacturing semiconductor device using acid diffusion'20148,536,347'Photoacid generator, chemically amplified resist composition including the same, and associated methods'20138,431,331'Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion'20138,314,036'Methods of forming fine patterns of semiconductor device'20128,227,349'Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same'20128,173,358'Method of forming fine patterns of a semiconductor device'20127,862,988'Method for forming patterns of semiconductor device'20117,842,450'Method of forming a semiconductor device'20107,678,650'Nonvolatile memory device and method of manufacturing the same'20107,560,768'Nonvolatile memory device and method of manufacturing the same'20096,803,176'Methods for forming line patterns in semiconductor substrates'20046,787,287'Photosensitive polymers and resist compositions comprising the photosensitive polymers'20046,753,125'Photosensitive polymer having fused aromatic ring and photoresist composition containing the same'20046,485,895'Methods for forming line patterns in semiconductor substrates'20026,300,036'Photosensitive polymers and chemically amplified photoresist compositions using the same'20016,284,438'Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same'20016,280,903'Chemically amplified resist composition'20016,114,084'Chemically amplified resist composition'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (26)· patent assignee history
2000–2004Based in Kyungki-do, KR· patent location history
2001–2004Based in Sungnam, KR· patent location history
2009–2011Based in Seongnam-si, KR· patent location history
2010–2020Based in Yongin-si, KR· patent location history
2012–2014Patents assigned to KANG YOOL (7)· patent assignee history
2012–2013Patents assigned to CHOI SEONG-WOON (3)· patent assignee history
2012–2014Patents assigned to HAN SO-RA (3)· patent assignee history
2012–2014Patents assigned to KIM HYOUNG-HEE (3)· patent assignee history
2013–2014Based in Gyeonggi-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 26 | 2000–2020 |
| KANG YOOLself | 7 | 2012–2014 |
| CHOI SEONG-WOON | 3 | 2012–2013 |
| HAN SO-RA | 3 | 2012–2014 |
| KIM HYOUNG-HEE | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yongin-si, KR | 13 | 2010–2020 |
| Kyungki-do, KR | 5 | 2000–2004 |
| Seongnam-si, KR | 3 | 2009–2011 |
| Sungnam, KR | 3 | 2001–2004 |
| Gyeonggi-do, KR | 2 | 2013–2014 |