Inventor

Guojun Liu

Inventor
San Jose, CA, US

Overview

23→
Patents
1995–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
B82YSpecific uses or applications of nanostructures6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
Y02PClimate change mitigation technologies in the production or processing of goods6%
B01DSeparation5%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H04RLoudspeakers, microphones, gramophone pick-ups or like acoustic electromechanical transducers5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation5%
PatentTitleYear
10,874,991Functional filters for hydrophobic liquid/hydrophilic liquid separations202010,858,917Expandable liner hanger202010,556,970Method for preparing high transparent low acyl gellan gum202010,023,751Anti-smudge and anti-graffiti compositions20189,953,813Methods and apparatus for improved metal ion filtering20189,924,254'To detect the ambient temperature around the MEMS microphone'20189,831,074Bipolar collimator utilized in a physical vapor deposition chamber20179,699,538'MEMS microphone device'20179,614,364'Detection system and detection method of distributed generation islanding based on power frequency carrier'20179,510,109'MEMS microphone device'20169,466,524'Method of depositing metals using high frequency plasma'20169,378,957'Silicon substrates with doped surface contacts formed from doped silicon based inks and corresponding processes'20169,006,720'Silicon/germanium nanoparticles and inks having low metal contamination'20158,983,107'Silicon based capacitive microphone'20158,912,083'Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes'20148,895,962'Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods'20148,749,413'Digital correction circuit for a pipelined analog-to-digital converter'20146,654,470'Frequency warping for improving resonator signal-to-noise ratio'20036,534,319'Chemical sensor and coating for same'20036,458,310'Process of making a polymeric material having a microporous matrix'20026,432,362'Chemical sensor and coating for same'20026,237,397'Chemical sensor and coating for same'20015,409,739'Monolayer coating'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to UNIV IOWA STATE RES FOUND INC (3)· patent assignee history
2001–2003Based in Ames, IA, US· patent location history
2014–2018Patents assigned to LIU GUOJUN (7)· patent assignee history
2014–2016Patents assigned to NANOGRAM CORP (4)· patent assignee history
2014–2018Based in San Jose, CA, US· patent location history
2015–2018Based in Shenzhen, CN· patent location history
2016–2018Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2016–2017Patents assigned to AAC ACOUSTIC TECH (SHENZHEN) CO LTD (2)· patent assignee history
2017–2020Based in Beijing, CN· patent location history
2018–2020Based in Kingston, CA· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LIU GUOJUNself72014–2018
NANOGRAM CORP42014–2016
APPLIED MATERIALS INC32016–2018
UNIV IOWA STATE RES FOUND INC32001–2003
AAC ACOUSTIC TECH (SHENZHEN) CO LTD22016–2017
Locations
LocationPatentsSpan
San Jose, California, US62014–2018
Shenzhen, CN42015–2018
Ames, IA, US42001–2003
Kingston, CA22018–2020
Beijing, CN22017–2020