Inventor

Mohamad A. Shaheen

Inventor
Portland, OR, US

Overview

27→
Patents
2003–2014
Patent span
Electricity
Primary field (CPC H)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H10DInorganic electric semiconductor devices26%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1019%
B23KSoldering or unsoldering4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
H10BElectronic memory devices3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
Y10TTechnical subjects covered by former us classification1%
PatentTitleYear
8,735,946'Substrate having a charged zone in an insulating buried layer'20148,617,945'Stacking fault and twin blocking barrier for integrating III-V on Si'20138,535,996'Substrate having a charged zone in an insulating buried layer'20138,143,646'Stacking fault and twin blocking barrier for integrating III-V on Si'20128,084,818'High mobility tri-gate devices and methods of fabrication'20118,034,675'Semiconductor buffer architecture for III-V devices on silicon substrates'20117,851,780'Semiconductor buffer architecture for III-V devices on silicon substrates'20107,851,781'Buffer layers for device isolation of devices grown on silicon'20107,723,749'Strained semiconductor structures'20107,670,928'Ultra-thin oxide bonding for S1 to S1 dual orientation bonding'20107,573,059'Dislocation-free InSb quantum well structure on Si using novel buffer architecture'20097,569,857'Dual crystal orientation circuit devices on the same substrate'20097,494,911'Buffer layers for device isolation of devices grown on silicon'20097,473,614'Method for manufacturing a silicon-on-insulator (SOI) wafer with an etch stop layer'20097,378,331'Methods of vertically stacking wafers using porous silicon'20087,355,247'Silicon on diamond-like carbon devices'20087,279,369'Germanium on insulator fabrication via epitaxial germanium bonding'20077,202,503'III-V and II-VI compounds as template materials for growing germanium containing film on silicon'20077,161,224'Complete device layer transfer without edge exclusion via direct wafer bonding and constrained bond-strengthening process'20077,157,379'Strained semiconductor structures'20077,148,122'Bonding of substrates'20067,052,978'Arrangements incorporating laser-induced cleaving'20067,042,009'High mobility tri-gate devices and methods of fabrication'20066,911,380'Method of forming silicon on insulator wafers'20056,908,027'Complete device layer transfer without edge exclusion via direct wafer bonding and constrained bond-strengthening process'20056,833,195'Low temperature germanium transfer'20046,645,831'Thermally stable crystalline defect-free germanium bonded to silicon and silicon dioxide'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2013Patents assigned to INTEL CORP (25)· patent assignee history
2003–2014Based in Portland, OR, US· patent location history
2011–2013Patents assigned to SHAHEEN MOHAMAD A (3)· patent assignee history
2012–2013Patents assigned to CHOW LOREN A (2)· patent assignee history
2012–2013Patents assigned to FASTENAU JOEL M (2)· patent assignee history
2012–2013Patents assigned to HUDAIT MANTU K (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INTEL CORP252003–2013
SHAHEEN MOHAMAD Aself32011–2013
CHOW LOREN A22012–2013
FASTENAU JOEL M22012–2013
HUDAIT MANTU K22012–2013
Locations
LocationPatentsSpan
Portland, OR, US272003–2014