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Inventor

Hong Chen

Inventor
Hsinchu, TW

Overview

5→
Patents
2004–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G06TImage data processing or generation, in general15%
G06VImage or video recognition or understanding15%
H01LSemiconductor devices15%
H10DInorganic electric semiconductor devices15%
B08BCleaning in general8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
10,804,373Method for forming a low-k spacer202010,361,282Method for forming a low-K spacer20197,039,216'Automatic sketch generation'20066,845,171'Automatic sketch generation'20056,832,422'Apparatus for assembling a post-CMP cleaning brush'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to NANYA TECHNOLOGY CORP (1)· patent assignee history
2004Based in Kaohsiung, TW· patent location history
2005–2006Patents assigned to MICROSOFT CORP (2)· patent assignee history
2005–2006Based in Beijing, CN· patent location history
2019–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2019–2020Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MICROSOFT CORP22005–2006
TAIWAN SEMICONDUCTOR MFG CO LTD22019–2020
NANYA TECHNOLOGY CORP12004
Locations
LocationPatentsSpan
Hsinchu, TW22019–2020
Beijing, CN22005–2006
Kaohsiung, TW12004