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Inventor

Takeshi Kurose

Inventor
Ehime, JP

Overview

5→
Patents
2010–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices20%
G11BInformation storage based on relative movement between record carrier and transducer10%
PatentTitleYear
9,646,837'Ion implantation method and ion implantation apparatus'20179,564,289'Ion implanter and method of controlling the same'20179,412,561'Ion implantation method and ion implantation apparatus'20168,692,216'Ion implantation apparatus and control method thereof'20147,719,938'Optical disk recording/reproducing apparatus and optical disk recording method'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Patents assigned to PANASONIC CORP (1)· patent assignee history
2010–2017Based in Ehime, JP· patent location history
2014–2017Patents assigned to SEN CORP (2)· patent assignee history
2014–2017Based in Tokyo, JP· patent location history
2016–2017Patents assigned to SUMITOMO HEAVY IND ION TECH CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEN CORP22014–2017
SUMITOMO HEAVY IND ION TECH CO LTD22016–2017
PANASONIC CORP12010
Locations
LocationPatentsSpan
Ehime, JP32010–2017
Tokyo, JP22014–2017