LexDanaLexDanabeta
Inventor

KENJI FUNATSU

Inventor
JP

Overview

2→
Patents
2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
C09DCoating compositions, e.g. paints, varnishes or lacquers17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
PatentTitleYear
12,429,772Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound202512,271,112Negative resist composition and pattern forming process2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO22025
Locations
LocationPatentsSpan
JP22025