Inventor

Paul M. Raccah

Inventor

Chicago, IL, US

Overview

12→

Patents

1976–1993

Patent span

Electricity

Primary field (CPC H)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Kprimary

H10KOrganic electric solid-state devices14%

C03CChemical composition of glasses, glazes or vitreous enamels13%

H10DInorganic electric semiconductor devices11%

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%

C01BNon-metallic elements7%

C09KMaterials for miscellaneous applications, not provided for elsewhere7%

C23CCoating metallic material7%

C30BSingle-crystal growth7%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

PatentTitleYear

5,247,349'Passivation and insulation of III-V devices with pnictides, particularly amorphous pnictides having a layer-like structure'1993 5,032,472'Films of catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them'1991 4,822,581'Catenated phosphorus materials and their preparation'1989 4,818,636'Films of catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them'1989 4,713,192'Doping of catenated phosphorus materials'1987 4,696,828'Passivation of InP by plasma deposited phosphorus'1987 4,620,968'Monoclinic phosphorus formed from vapor in the presence of an alkali metal'1986 4,508,931'Catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them'1985 4,291,975'Apparatus for determining the color characteristics of a gem'1981 4,221,827'Method of manufacturing a gas sensor'1980 4,142,802'Method and apparatus for measuring variations in composition in binary and ternary semiconductors utilizing electrolyte electroreflectance'1979 3,962,715'High-speed, high-current spike suppressor and method for fabricating same'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1979Patents assigned to UNIV YESHIVA (2)· patent assignee history

1976Based in Hillside, NJ, US· patent location history

1979–1993Based in Chicago, IL, US· patent location history

1980Patents assigned to US INTERIOR (1)· patent assignee history

1981Patents assigned to SCIENT GEM IDENTIFICATION INC (1)· patent assignee history

1985–1993Patents assigned to STAUFFER CHEMICAL CO (8)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
STAUFFER CHEMICAL CO	8	1985–1993
UNIV YESHIVA	2	1976–1979
SCIENT GEM IDENTIFICATION INC	1	1981
US INTERIOR	1	1980

Locations

Location	Patents	Span
Chicago, Illinois, US	11	1979–1993
Hillside, New Jersey, US	1	1976