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Inventor

Norio Uchihira

Inventor
Kumamoto, JP

Overview

4→
Patents
1999–2001
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B05CApparatus for applying fluent materials to surfaces, in general21%
B08BCleaning in general14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
B05DProcesses for applying fluent materials to surfaces, in general7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G11BInformation storage based on relative movement between record carrier and transducer7%
PatentTitleYear
6,261,378'Substrate cleaning unit and cleaning method'20016,062,240'Treatment device'20006,058,544'Scrubbing apparatus and scrubbing method'20005,945,161'Apparatus and method for supplying process solution to surface of substrate to be processed'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2001Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
1999–2000Based in Kumamoto, JP· patent location history
2001Based in Tamana, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD41999–2001
Locations
LocationPatentsSpan
Kumamoto, JP31999–2000
Tamana, JP12001