Inventor
Paul C. Lemaire
Inventor
Portland, OR, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material19%
H01LSemiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1019%
H01JElectric discharge tubes or discharge lamps13%
H10DInorganic electric semiconductor devices6%
PatentTitleYear
11,107,683Selective growth of metal-containing hardmask thin films202110,662,526Method for selective deposition using a base-catalyzed inhibitor202010,643,846Selective growth of metal-containing hardmask thin films202010,643,889Pre-treatment method to improve selectivity in a selective deposition process2020Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2020–2021Patents assigned to LAM RES CORP (4)· patent assignee history
2020Patents assigned to LAM RASEARCH CORP (1)· patent assignee history
2020–2021Based in Portland, OR, US· patent location history
2020Based in Raleigh, NC, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 4 | 2020–2021 |
| LAM RASEARCH CORP | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 2 | 2020–2021 |
| Raleigh, NC, US | 2 | 2020 |