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Inventor

Yumiko Wada

Inventor
Hitachi, JP

Overview

3→
Patents
1997–2002
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H01JElectric discharge tubes or discharge lamps40%
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
PatentTitleYear
6,416,931'Photosensitive element for preparing a phosphor pattern'20026,329,111'Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same'20015,646,198'Coating composition and antifouling paint'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2002Patents assigned to HITACHI CHEMICAL CO LTD (3)· patent assignee history
1997–2002Based in Hitachi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD31997–2002
Locations
LocationPatentsSpan
Hitachi, JP31997–2002