Inventor
Scott D. Hector
Inventor
Austin, TX, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
B82YSpecific uses or applications of nanostructures24%
G21KHandling of particles or ionising radiation not otherwise provided for14%
B25DPercussive tools3%
B25GHandles for hand implements3%
B29CShaping or joining of plastics3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
C23CCoating metallic material3%
G06FElectric digital data processing3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
10,974,423Wood handle with overmold and method of manufacture20217,904,869'Method of area compaction for integrated circuit layout design'20117,282,307'Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same'20076,986,974'Attenuated phase shift mask for extreme ultraviolet lithography and method therefore'20066,986,971'Reflective mask useful for transferring a pattern using extreme ultraviolet (EUV) radiation and method of making the same'20066,835,671'Method of making an integrated circuit using an EUV mask formed by atomic layer deposition'20046,815,129'Compensation of flare-induced CD changes EUVL'20046,673,520'Method of making an integrated circuit using a reflective mask'20046,596,465'Method of manufacturing a semiconductor component'20036,492,067'Removable pellicle for lithographic mask protection and handling'20026,352,803'Coatings on reflective mask substrates'20026,001,513'Method for forming a lithographic mask used for patterning semiconductor die'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2004Patents assigned to MOTOROLA INC (3)· patent assignee history
1999Based in Berkeley, CA, US· patent location history
2002–2004Patents assigned to EUV LLC (2)· patent assignee history
2002–2004Based in Oakland, CA, US· patent location history
2004–2011Patents assigned to FREESCALE SEMICONDUCTOR INC (5)· patent assignee history
2004–2011Based in Austin, TX, US· patent location history
2021Patents assigned to BENNETT JIM H (1)· patent assignee history
2021Patents assigned to GIBSON ROYDEN H (1)· patent assignee history
2021Based in Dexter, MO, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FREESCALE SEMICONDUCTOR INC | 5 | 2004–2011 |
| MOTOROLA INC | 3 | 1999–2004 |
| EUV LLC | 2 | 2002–2004 |
| BENNETT JIM H | 1 | 2021 |
| GIBSON ROYDEN H | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 6 | 2004–2011 |
| Oakland, California, US | 4 | 2002–2004 |
| Dexter, MO, US | 1 | 2021 |
| Berkeley, California, US | 1 | 1999 |