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Inventor

Hideki Kurita

Inventor
Kitaibaraki, JP

Overview

7→
Patents
2005–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C30Bprimary
C30BSingle-crystal growth38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
B24BMachines, devices, or processes for grinding or polishing8%
H01LSemiconductor devices8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
10,679,842Semiconductor wafer, and method for polishing semiconductor wafer20208,513,775'CdTe semiconductor substrate for epitaxial growth and substrate container'20137,875,957'Semiconductor substrate for epitaxial growth and manufacturing method thereof'20117,745,854'Substrate for growing compound semiconductor and epitaxial growth method'20107,510,082'Wafer storage container'20097,338,902'Epitaxial growth method and substrate for epitaxial growth'20086,900,522'Chamfered semiconductor wafer and method of manufacturing the same'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005Patents assigned to NIKKO MATERIALS CO LTD (1)· patent assignee history
2005–2013Based in Kitaibaraki, JP· patent location history
2008–2011Patents assigned to NIPPON MINING CO (4)· patent assignee history
2013–2020Patents assigned to JX NIPPON MINING & METALS CORP (2)· patent assignee history
2013Patents assigned to HIRANO RYUICHI (1)· patent assignee history
2013Patents assigned to KURITA HIDEKI (1)· patent assignee history
2020Based in Ibaraki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON MINING CO42008–2011
JX NIPPON MINING & METALS CORP22013–2020
HIRANO RYUICHI12013
KURITA HIDEKIself12013
NIKKO MATERIALS CO LTD12005
Locations
LocationPatentsSpan
Kitaibaraki, JP62005–2013
Ibaraki, JP12020