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Inventor

NOBUAKI SHINDO

Inventor
JP

Overview

3→
Patents
2023–2024
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling14%
C23CCoating metallic material14%
H01LSemiconductor devices14%
H02NElectric machines not otherwise provided for14%
PatentTitleYear
11,887,824Method of cleaning plasma processing apparatus and plasma processing apparatus202411,705,309Substrate processing method202311,557,498Substrate processing method and substrate processing apparatus2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2024Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2023–2024Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32023–2024
Locations
LocationPatentsSpan
JP32023–2024