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Inventor

Zhangnan ZHU

Inventor
US

Overview

2→
Patents
2023–2025
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G06FElectric digital data processing50%
PatentTitleYear
12,430,490Method for generating patterning device pattern at patch boundary202511,797,748Method for generating patterning device pattern at patch boundary2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2023–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22023–2025
Locations
LocationPatentsSpan
US22023–2025