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Inventor

JUNYA HORIUCHI

Inventor
JP

Overview

2→
Patents
2023–2024
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds18%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds18%
C09DCoating compositions, e.g. paints, varnishes or lacquers18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices9%
PatentTitleYear
12,134,596Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin202411,747,728Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2024Patents assigned to MITSUBISHI GAS CHEMICAL CO (2)· patent assignee history
2023–2024Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO22023–2024
Locations
LocationPatentsSpan
JP22023–2024