LexDanaLexDanabeta
Inventor

Masaki Satake

Inventor
Odawara, JP

Overview

33→
Patents
1985–2020
Patent span
Physics
Primary field (CPC G)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests24%
G11BInformation storage based on relative movement between record carrier and transducer21%
Y10TTechnical subjects covered by former us classification19%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
G03CPhotosensitive materials for photographic purposes10%
G06FElectric digital data processing4%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h101%
PatentTitleYear
10,866,197Dispositioning defects detected on extreme ultraviolet photomasks20209,696,619'Technique for repairing a reflective photo-mask'20179,547,233'Film-growth model using level sets'20179,494,854'Technique for repairing an EUV photo-mask'20169,005,852'Technique for repairing a reflective photo-mask'20158,122,385'Mask pattern correcting method'20128,077,292'Projection exposure method'20117,901,853'Pattern prediction method, pattern correction method, semiconductor device, and recording medium'20117,870,532'Lithography simulation method, method of manufacturing a semiconductor device and program'20117,840,390'Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium'20107,831,953'Lithography simulation method, program and semiconductor device manufacturing method'20107,784,017'Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium'20106,376,083'Magnetic recording medium'20026,010,773'Magnetic recording medium'20005,972,515'Magnetic recording medium'19995,908,691'Magnetic recording medium having a lower layer containing a specified polyurethane binder'19995,747,157'Magnetic recording medium'19985,702,821'Magnetic recording medium comprising ferromagnetic powder and a specified polyurethane resin'19975,612,134'Magnetic recording medium having a carbon protective layer and a fluoro-lubricant supplied from a backcoat layer'19975,607,782'Magnetic recording medium'19975,567,524'Magnetic recording medium having a cobalt thin film magnetic layer, carbon protective layer, and fluorolubricant layer'19965,525,418'Magnetic recording medium having a magnetic layer containing ferromagnetic powder and a polyurethane resin obtained from a polyolefin polyol or a polybutadiene polyol'19965,496,645'Magnetic recording medium comprising a magnetic metallic thin film and a layer containing a specified fluorine compound and a specified tetrazaindene cyclic compound or thiouracil cyclic compound'19965,492,764'Magnetic recording medium having a protective layer containing a tetrazaindene or thiouracil cyclic compound and a fluorine compound'19965,484,661'Magnetic recording medium having a polyvinyl alkyl binder resin'19965,458,979'Magnetic recording medium having a magnetic layer comprising ferromagnetic particles, polyurethane resin and polyvinylacetal resin'19954,996,130'Silver halide photographic material'19914,985,338'Silver halide photographic material'19914,859,576'Silver halide photographic material comprising a protective layer containing a polyoxyethylene surface active agent'19894,833,063'Color diffusion transfer element comprising two neutralizing layers and two timing layers'19894,797,353'Method for developing of silver halide photographic materials utilizing reduced amounts of organic substances'19894,710,456'Silver halide photographic material'19874,551,410'Photographic element for color diffusion transfer with two neutralizing layers'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–2002Patents assigned to FUJI PHOTO FILM CO LTD (21)· patent assignee history
1985–2011Based in Kanagawa, JP· patent location history
1996–2002Based in Odawara, JP· patent location history
2010–2012Patents assigned to TOSHIBA KK (7)· patent assignee history
2010–2012Based in Yokohama, JP· patent location history
2011–2012Patents assigned to FUKUHARA KAZUYA (2)· patent assignee history
2015–2017Based in Cupertino, CA, US· patent location history
2016–2017Patents assigned to DINO TECH ACQUISITION LLC (3)· patent assignee history
2016–2017Patents assigned to KLA TENCOR CORP (2)· patent assignee history
2016–2017Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJI PHOTO FILM CO LTD211985–2002
TOSHIBA KK72010–2012
DINO TECH ACQUISITION LLC32016–2017
FUKUHARA KAZUYA22011–2012
KLA TENCOR CORP22016–2017
Locations
LocationPatentsSpan
Odawara, JP121996–2002
Kanagawa, JP91985–2011
Yokohama, JP62010–2012
Cupertino, California, US22015–2017
San Jose, California, US22016–2017