Inventor
Yoshifumi Tahara
Inventor
Yamato, JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1045%
H01JElectric discharge tubes or discharge lamps31%
C23CCoating metallic material7%
C23FNon-mechanical removal of metallic material from surface5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
C03CChemical composition of glasses, glazes or vitreous enamels2%
G01RMeasuring electric variables2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
7,209,851'Method and structure to develop a test program for semiconductor integrated circuits'20076,423,242'Etching method'20026,110,287'Plasma processing method and plasma processing apparatus'20005,858,258'Plasma processing method'19995,705,081'Etching method'19985,698,070'Method of etching film formed on semiconductor wafer'19975,571,366'Plasma processing apparatus'19965,494,522'Plasma process system and method'19965,449,977'Apparatus and method for generating plasma of uniform flux density'19955,411,631'Dry etching method'19955,382,311'Stage having electrostatic chuck and plasma processing apparatus using same'19955,356,515'Dry etching method'19945,302,236'Method of etching object to be processed including oxide or nitride portion'19945,270,266'Method of adjusting the temperature of a semiconductor wafer'19935,203,958'Processing method and apparatus'19935,164,034'Apparatus and method for processing substrate'19925,155,331'Method for cooling a plasma electrode system for an etching apparatus'19925,089,083'Plasma etching method'19924,978,412'Plasma processing device'19904,963,713'Cooling of a plasma electrode system for an etching apparatus'19904,931,135'Etching method and etching apparatus'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–2002Patents assigned to TOKYO ELECTRON LTD (20)· patent assignee history
1990–1999Based in Yamato, JP· patent location history
1993–2000Based in Tokyo, JP· patent location history
1994Patents assigned to TOSHIBA KK (2)· patent assignee history
1994–1995Based in Machida, JP· patent location history
1995Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (1)· patent assignee history
1995Patents assigned to TEL YAMANISHI KK (1)· patent assignee history
2002Based in Nishikamo-gun, JP· patent location history
2007Patents assigned to ADVANTEST AMERICA R & D CT INC (1)· patent assignee history
2007Based in Sunnyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 20 | 1990–2002 |
| TOSHIBA KK | 2 | 1994 |
| ADVANTEST AMERICA R & D CT INC | 1 | 2007 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 1 | 1995 |
| TEL YAMANISHI KK | 1 | 1995 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yamato, JP | 9 | 1990–1999 |
| Tokyo, JP | 8 | 1993–2000 |
| Machida, JP | 2 | 1994–1995 |
| Sunnyvale, California, US | 1 | 2007 |
| Nishikamo-gun, JP | 1 | 2002 |