Inventor
Tsuneo Terasawa
Inventor
Ome, JP
Overview
Patents· 61 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B82YSpecific uses or applications of nanostructures4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G01BMeasuring length, thickness or similar linear dimensions2%
G02BOptical elements, systems or apparatus2%
G06TImage data processing or generation, in general2%
H01JElectric discharge tubes or discharge lamps2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
10,488,347Defect classification method, method of sorting photomask blanks, and method of manufacturing mask blank201910,295,477Methods for defect inspection, sorting, and manufacturing photomask blank20199,958,399Imaging apparatus and imaging method20189,829,787Defect inspecting method, sorting method, and producing method for photomask blank20179,829,442Defect inspecting method, sorting method and producing method for photomask blank20179,772,551'Evaluation method of defect size of photomask blank, selection method, and manufacturing method'20179,229,314'Method of inspecting mask, mask inspection device, and method of manufacturing mask'20169,063,098'Method of inspecting mask, mask inspection device, and method of manufacturing mask'20158,986,913'Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device'20158,912,501'Optimum imaging position detecting method, optimum imaging position detecting device, photomask manufacturing method, and semiconductor device manufacturing method'20148,797,524'Mask inspection method and mask inspection apparatus'20148,699,783'Mask defect inspection method and defect inspection apparatus'20148,488,866'Method of inspecting mask pattern and mask pattern inspection apparatus'20138,435,702'Manufacturing method of semiconductor device and manufacturing method of mask'20138,384,888'Mask defect measurement method, mask quality determination and method, and manufacturing method of semiconductor device'20137,911,600'Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits'20117,630,068'Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same'20097,369,703'Method and apparatus for circuit pattern inspection'20087,361,530'Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light'20087,205,222'Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light'20077,125,651'Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks'20067,095,884'Method and apparatus for circuit pattern inspection'20066,849,540'METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD OF PRODUCING A MULTI-CHIP MODULE THAT INCLUDES PATTERNING WITH A PHOTOMASK THAT USES METAL FOR BLOCKING EXPOSURE LIGHT AND A PHOTOMASK THAT USES ORGANIC RESIN FOR BLOCKING EXPOSURE LIGHT'20056,709,880'Semiconductor device and a manufacturing method of the same'20046,686,099'Method of manufacturing a photomask'20046,677,107'Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor'20046,667,135'Method of manufacturing a photomask'20036,656,645'Method of manufacturing a photomask'20036,645,856'Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate'20036,596,656'Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM'20036,329,112'Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens'20016,020,109'Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices'20005,932,395'Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices'19995,902,705'Exposure method, aligner, and method manufacturing semiconductor integrated circuit devices'19995,895,741'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'19995,700,601'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'19975,691,115'Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices'19975,621,497'Pattern forming method and projection exposure tool therefor'19975,595,857'Method of forming a pattern and projection exposure apparatus'19975,420,436'Methods for measuring optical system, and method and apparatus for exposure using said measuring method'19955,418,598'Projection exposure apparatus'19955,408,320'Workpiece having alignment marks for positioning a pattern at a different pitch to be formed thereon, and method for fabricating the same'19955,348,837'Projection exposure apparatus and pattern forming method for use therewith'19945,331,369'Method of forming patterns and apparatus for carrying out the same'19945,316,896'Method of forming a pattern'19945,305,364'Projection type X-ray lithography apparatus'19945,302,999'Illumination method, illumination apparatus and projection exposure apparatus'19945,296,995'Method of magnetically recording and reading data, magnetic recording medium, its production method and magnetic recording apparatus'19945,235,400'Method of and apparatus for detecting defect on photomask'19935,222,112'X-ray pattern masking by a reflective reduction projection optical system'19935,200,798'Method of position detection and the method and apparatus of printing patterns by use of the position detection method'19935,078,495'Monochromator'19924,983,039'Spectrometer'19914,894,343'Chamber plate for use in cell fusion and a process for production thereof'19904,798,470'Pattern printing method and apparatus'19894,750,364'Angular velocity and acceleration sensor'19884,614,432'Pattern detector'19864,597,669'Pattern detector'19864,504,726'Pattern generator'19854,477,183'Automatic focusing apparatus'19844,441,206'Pattern detecting apparatus'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–2008Patents assigned to HITACHI LTD (36)· patent assignee history
1986–1994Based in Hachioji, JP· patent location history
1993–2015Based in Ome, JP· patent location history
1993–2001Based in Ohme, JP· patent location history
2003–2013Patents assigned to RENESAS TECH CORP (9)· patent assignee history
2009–2013Based in Tokyo, JP· patent location history
2011–2016Patents assigned to RENESAS ELECTRONICS CORP (5)· patent assignee history
2013–2015Patents assigned to TERASAWA TSUNEO (7)· patent assignee history
2013–2018Patents assigned to TOSHIBA KK (7)· patent assignee history
2017Based in Joetsu-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 36 | 1984–2008 |
| RENESAS TECH CORP | 9 | 2003–2013 |
| TERASAWA TSUNEOself | 7 | 2013–2015 |
| TOSHIBA KK | 7 | 2013–2018 |
| RENESAS ELECTRONICS CORP | 5 | 2011–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ome, JP | 30 | 1993–2015 |
| Hachioji, JP | 9 | 1986–1994 |
| Tokyo, JP | 5 | 2009–2013 |
| Joetsu-shi, JP | 3 | 2017 |
| Ohme, JP | 3 | 1993–2001 |