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Inventor

Pedro Julian Rizo Diago

Inventor
Veldhoven, NL

Overview

2→
Patents
2017–2018
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G21KHandling of particles or ionising radiation not otherwise provided for33%
PatentTitleYear
10,139,725Lithographic apparatus20189,606,445'Lithographic apparatus and method of manufacturing a device'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2018Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2017–2018Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22017–2018
Locations
LocationPatentsSpan
Veldhoven, NL22017–2018