Inventor
Masayuki Okoshi
Inventor
Kanagawa, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Kprimary
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients31%
C08LCompositions of macromolecular compounds22%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them15%
Y10TTechnical subjects covered by former us classification7%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C08JWorking-up4%
LOC164%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
H05KPrinted circuits3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form1%
PatentTitleYear
10,626,244Resin composition and resin molded article202010,526,486Resin composition and resin molded article202010,442,913Resin composition and resin molded article201910,385,195Resin composition for resin molding, and resin molding201910,301,461Resin composition and resin molded article201910,221,287Resin composition and resin molded article201910,100,184Resin composition for resin molding, and resin molding201810,072,141Resin composition, resin molded article, and method of preparing resin composition201810,030,137Intermediate for resin molded article and resin molded article20189,663,646'Resin composition, resin molded article, and method of preparing resin composition'20179,562,154'Resin composition, resin molded article, and method of preparing resin composition'20179,482,934'Projector'20169,018,283'Resin composition'20158,992,026'Projector having a dynamically positioned shutter'20158,894,221'Projector having a replaceable light source device'20148,540,380'Projector with a radiation source'20138,507,711'Flame-retardant compound, flame-retardant particle, resin composition and resin formed body'20138,455,571'Flame-retardant particle, resin composition and resin formed body'20138,376,554'Projector having a dynamically positioned shutter'20138,258,221'Polylactic acid-based resin composition and molded article of polylactic acid-based resin'2012D0663760'Projector'20128,157,386'Projector'20128,148,453'Resin composition and molded product'20128,113,664'Projector'20128,053,516'Polylactic acid resin composition, method for producing polylactic acid resin composition, and polylactic acid resin molded article'20118,044,130'Surface-coated flame-retardant particle and method of producing the same, and flame-retardant resin composition and method of producing the same'20118,038,302'Projector including an image projecting device and an interior cooling device'20117,960,458'Flame retardant, resin composition and resin-molded article'20117,722,195'Projector with a detachably attaching lamp cover'20107,683,117'Resin composition, resin mold and method for producing the same'20107,553,891'Flame-retardant epoxy resin composition, and electronic device, laminated circuit board, multilayered circuit board and printed circuit board using the flame-retardant epoxy resin composition'20097,534,827'Flame-retardant resin composition and flame-retardant resin-molded article'20097,535,721'Casing for electronic device and projector having this casing for electronic device'20097,511,087'Sheath composition and cable using the same'2009D0575812'Projector'2008D0551691'Projector'20077,052,630'Resin additive composition and process for producing the same'20067,014,322'Duct and projector'20066,793,343'Projector provided with cooling mechanism'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2016Patents assigned to SEIKO EPSON CORP (15)· patent assignee history
2004–2016Based in Matsumoto, JP· patent location history
2008Based in Nagano, JP· patent location history
2009–2020Patents assigned to FUJI XEROX CO LTD (22)· patent assignee history
2009–2020Based in Kanagawa, JP· patent location history
2009–2019Based in Minami-ashigara, JP· patent location history
2012–2015Patents assigned to OKOSHI MASAYUKI (11)· patent assignee history
2012Patents assigned to IKUNO MASAYA (2)· patent assignee history
2013–2015Patents assigned to KOYAMA MIKA (2)· patent assignee history
2015Based in Suwa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI XEROX CO LTD | 22 | 2009–2020 |
| SEIKO EPSON CORP | 15 | 2004–2016 |
| OKOSHI MASAYUKIself | 11 | 2012–2015 |
| IKUNO MASAYA | 2 | 2012 |
| KOYAMA MIKA | 2 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 14 | 2009–2020 |
| Matsumoto, JP | 13 | 2004–2016 |
| Minami-ashigara, JP | 9 | 2009–2019 |
| Suwa, JP | 1 | 2015 |
| Nagano, JP | 1 | 2008 |