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Inventor

GERALD DICKER

Inventor
NL

Overview

2→
Patents
2024–2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G01BMeasuring length, thickness or similar linear dimensions11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G05BControl or regulating systems in general11%
G06NComputing arrangements based on specific computational models11%
H01LSemiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02PClimate change mitigation technologies in the production or processing of goods11%
PatentTitleYear
12,591,178Method for adjusting a patterning process202611,977,034Methods and apparatus for measuring a property of a substrate2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2024Based in TW· patent location history
2026Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22024–2026
Locations
LocationPatentsSpan
NL12026
TW12024