Inventor
Johannes Georg Laven
Inventor
Taufkirchen, DE
Overview
Patents· 121 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices31%
H10DInorganic electric semiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
H03KPulse technique5%
H10NElectric solid-state devices not otherwise provided for2%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems1%
H10BElectronic memory devices1%
H01JElectric discharge tubes or discharge lamps1%
G01KMeasuring temperature1%
PatentTitleYear
11,133,303Semiconductor device and semiconductor arrangement comprising semiconductor devices202111,133,380Diode structure of a power semiconductor device202111,121,242Method of operating a semiconductor device having a desaturation channel structure202111,081,481Semiconductor device with an IGBT region and a non-switchable diode region202111,075,290Power semiconductor device having a cross-trench arrangement202111,018,051Power semiconductor device with reliably verifiable p-contact and method202110,978,560Power semiconductor device with dV/dt controllability and low gate charge202110,930,772IGBT having a barrier region202110,910,487Power semiconductor device having trench electrodes biased at three different electrical potentials, and method of manufacturing the same202110,903,344Semiconductor device with separation regions202110,886,909Electric assembly including an insulated gate bipolar transistor device and a wide-bandgap transistor device202110,854,739Method for producing IGBT with dV/dt controllability202010,840,362IGBT with dV/dt controllability202010,825,906Semiconductor device with transistor cells and enhancement cells with delayed control signals202010,734,507Method of operating a semiconductor device having a desaturation channel structure and related methods of manufacture202010,679,857Vertical transistor with trench gate insulator having varying thickness202010,679,855Method for producing a superjunction device202010,670,474Temperature sensor202010,651,165Semiconductor device having overload current carrying capability202010,644,496Semiconductor device with surge current protection202010,629,676Semiconductor device with cell trench structures and recessed contacts and method of manufacturing a semiconductor device202010,622,268Apparatus and method for ion implantation202010,615,039Semiconductor device having a device doping region of an electrical device arrangement202010,615,272Method for producing IGBT with dV/dt controllability202010,608,104Trench transistor device202010,580,653Method of forming a semiconductor device202010,529,838Semiconductor device having a variable carbon concentration202010,497,801Method of manufacturing a semiconductor device having an undulated profile of net doping in a drift zone201910,475,910Semiconductor device having an insulated gate bipolar transistor arrangement201910,475,909Electric assembly including a bipolar switching device and a wide bandgap transistor201910,461,739Transistor device201910,439,055IGBT with dV/dt controllability201910,424,645Semiconductor device, method for testing a semiconductor device and method for forming a semiconductor device201910,403,556Semiconductor device including a heat sink structure201910,404,250Transistor device201910,381,467Semiconductor device with separation regions201910,366,895Methods for forming a semiconductor device using tilted reactive ion beam201910,347,754Power semiconductor device with dV/dt controllability through select trench electrode biasing, and method of manufacturing the same201910,340,337Diode structure of a power semiconductor device201910,333,387Electric assembly including a semiconductor switching device and a clamping diode201910,325,809Methods for splitting semiconductor devices and semiconductor device201910,312,258Semiconductor device with buried cavities and dielectric support structures201910,304,952Power semiconductor device with dV/dt controllability and cross-trench arrangement201910,229,990Semiconductor device having a desaturation channel structure for desaturating a charge carrier concentration in an IGBT cell201910,217,837Method of manufacturing a semiconductor device having electrode trenches, isolated source zones and separation structures201910,211,325Semiconductor device including undulated profile of net doping in a drift zone201910,200,028Electric assembly including a reverse conducting switching device and a rectifying device201910,192,955Semiconductor device containing oxygen-related thermal donors201910,164,079Power semiconductor device201810,153,275Method of operating an IGBT having switchable and non-switchable diode cells201810,128,328Method of manufacturing semiconductor devices and semiconductor device containing hydrogen-related donors201810,109,489Method for producing a superjunction device201810,096,677Methods for forming a semiconductor device and a semiconductor device201810,096,531Semiconductor device with sensor potential in the active region201810,083,835Forming electrode trenches by using a directed ion beam and semiconductor device with trench electrode structures201810,075,158Method and drive circuit for driving a transistor201810,037,887Method for implanting ions into a semiconductor substrate and an implantation system201810,033,370Circuit and method for driving a power semiconductor switch20189,997,359Semiconductor device with rear-side insert structure20189,997,602Semiconductor device with transistor cells and enhancement cells with delayed control signals20189,972,704Method for forming a semiconductor device and a semiconductor device20189,972,689Semiconductor device having a surface with ripples20189,966,461Power semiconductor device20189,960,044Semiconductor device and methods for forming a semiconductor device20189,941,274Semiconductor device with a switchable and a non-switchable diode region20189,935,126Method of forming a semiconductor substrate with buried cavities and dielectric support structures20189,923,482'System and method for a power inverter with controllable clamps'20189,917,186'Semiconductor device with control structure including buried portions and method of manufacturing'20189,899,504'Power semiconductor transistor having increased bipolar amplification'20189,899,478'Desaturable semiconductor device with transistor cells and auxiliary cells'20189,876,100Semiconductor device and reverse conducting insulated gate bipolar transistor with isolated source zones20189,853,137Method for forming a semiconductor device and a semiconductor device20179,847,229Method for forming a semiconductor device and semiconductor device20179,837,506Method of manufacturing a semiconductor device having electrode trenches, isolated source zones and separation structures20179,825,131'Method of manufacturing semiconductor devices and semiconductor device containing oxygen-related thermal donors'20179,754,787'Method for treating a semiconductor wafer'20179,748,102'Semiconductor chip arrangement and method thereof'20179,741,795'IGBT having at least one first type transistor cell and reduced feedback capacitance'20179,728,627'Method for forming a semiconductor device and a semiconductor device'20179,711,641'Semiconductor device with cell trench structures and a contact structure'20179,691,887'Semiconductor device with variable resistive element'20179,679,892'Method of manufacturing a reverse blocking semiconductor device'20179,666,665'Semiconductor device with semiconductor mesa including a constriction'20179,666,663'Semiconductor device with cell trench structures and contacts and method of manufacturing a semiconductor device'20179,660,029'Semiconductor device having a positive temperature coefficient structure'20179,653,568'Method of manufacturing an insulated gate bipolar transistor with mesa sections between cell trench structures'20179,641,168'Controlling reverse conducting IGBT'20179,640,401'Method of manufacturing a semiconductor device having a rear-side insert structure'20179,634,086'Method of manufacturing semiconductor devices using light ion implantation and semiconductor device'20179,621,133'Method of operating a semiconductor device having an IGBT and desaturation channel structure'20179,613,805'Method for forming a semiconductor device'20179,576,944'Semiconductor devices with transistor cells and thermoresistive element'20179,570,577'Semiconductor device and insulated gate bipolar transistor with source zones formed in semiconductor mesas'20179,564,495'Semiconductor device with a semiconductor body containing hydrogen-related donors'20179,553,179'Semiconductor device and insulated gate bipolar transistor with barrier structure'20179,543,398'Semiconductor switching device including charge storage structure'20179,543,389'Semiconductor device with recombination region'20179,536,740'Increasing the doping efficiency during proton irradiation'20179,536,999'Semiconductor device with control structure including buried portions and method of manufacturing'20179,515,243'Temperature sensor'20169,515,066'Semiconductor device having an insulated gate bipolar transistor arrangement and a method for forming such a semiconductor device'20169,496,364'Field effect semiconductor component and methods for operating and producing it'20169,496,351'Semiconductor chip arrangement'20169,419,080'Semiconductor device with recombination region'20169,385,222'Semiconductor device with insert structure at a rear side and method of manufacturing'20169,385,228'Semiconductor device with cell trench structures and contacts and method of manufacturing a semiconductor device'20169,312,135'Method of manufacturing semiconductor devices including generating and annealing radiation-induced crystal defects'20169,263,271'Method for processing a semiconductor carrier, a semiconductor chip arrangement and a method for manufacturing a semiconductor device'20169,245,984'Reverse blocking semiconductor device, semiconductor device with local emitter efficiency modification and method of manufacturing a reverse blocking semiconductor device'20169,231,091'Semiconductor device and reverse conducting insulated gate bipolar transistor with isolated source zones'20169,166,027'IGBT with reduced feedback capacitance'20159,147,727'Semiconductor device and method for forming a semiconductor device'20159,105,679'Semiconductor device and insulated gate bipolar transistor with barrier regions'20159,105,487'Super junction semiconductor device'20159,093,568'Semiconductor diode'20159,082,629'Semiconductor device and method for forming a semiconductor device'20159,076,838'Insulated gate bipolar transistor with mesa sections between cell trench structures and method of manufacturing'20159,054,035'Increasing the doping efficiency during proton irradiation'20159,024,413'Semiconductor device with IGBT cell and desaturation channel structure'20158,895,453'Semiconductor device with an insulation layer having a varying thickness'20148,710,620'Method of manufacturing semiconductor devices using ion implantation'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2021Patents assigned to INFINEON TECHNOLOGIES AG (114)· patent assignee history
2014Patents assigned to FUCHS DIETER (1)· patent assignee history
2014–2021Based in Taufkirchen, DE· patent location history
2017–2020Patents assigned to INFINEON TECHNOLOGIES AUSTRIA AG (5)· patent assignee history
2018Based in Taufkrichen, DE· patent location history
2019Patents assigned to INFINEON TECHNOLOGIES DRESDEN GMBH (1)· patent assignee history
2021Patents assigned to INFINEON TECH DRESDEN GMBH & CO KG (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 114 | 2014–2021 |
| INFINEON TECHNOLOGIES AUSTRIA AG | 5 | 2017–2020 |
| INFINEON TECH DRESDEN GMBH & CO KG | 2 | 2021 |
| FUCHS DIETER | 1 | 2014 |
| INFINEON TECHNOLOGIES DRESDEN GMBH | 1 | 2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taufkirchen, DE | 120 | 2014–2021 |
| Taufkrichen, DE | 1 | 2018 |