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Inventor

Bart Rijpers

Inventor
Eindhoven, NL

Overview

1→
Patents
2011
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1050%
PatentTitleYear
7,879,682'Marker structure and method for controlling alignment of layers of a multi-layered substrate'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2011Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12011
Locations
LocationPatentsSpan
Eindhoven, NL12011