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Inventor

Masanobu Habiro

Inventor
Hitachi, JP

Overview

3→
Patents
2008–2015
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C09GPolishing compositions17%
B24DTools for grinding, buffing or sharpening8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
C23FNon-mechanical removal of metallic material from surface8%
H01LSemiconductor devices8%
PatentTitleYear
9,022,834'Polishing solution for CMP and polishing method using the polishing solution'20158,486,837'Polishing slurry for metal, and polishing method'20137,374,474'Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2015Patents assigned to HITACHI CHEMICAL CO LTD (3)· patent assignee history
2008–2015Based in Hitachi, JP· patent location history
2013–2015Patents assigned to HABIRO MASANOBU (2)· patent assignee history
2015Patents assigned to CHINONE KANSHI (1)· patent assignee history
2015Patents assigned to ENOMOTO KAZUHIRO (1)· patent assignee history
2015Patents assigned to FUKASAWA MASATO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD32008–2015
HABIRO MASANOBUself22013–2015
CHINONE KANSHI12015
ENOMOTO KAZUHIRO12015
FUKASAWA MASATO12015
Locations
LocationPatentsSpan
Hitachi, JP32008–2015