LexDanaLexDanabeta
Inventor

Rajesh Kanuri

Inventor
Santa Clara, CA, US

Overview

4→
Patents
2009–2012
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1057%
C23CCoating metallic material43%
PatentTitleYear
8,338,316'Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants'20127,968,473'Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants'20117,588,990'Dynamic surface annealing of implanted dopants with low temperature HDPCVD process for depositing a high extinction coefficient optical absorber layer'20097,547,621'LPCVD gate hard mask'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2012Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2009–2012Based in Santa Clara, CA, US· patent location history
2012Patents assigned to BENCHER CHRISTOPHER DENNIS (1)· patent assignee history
2012Patents assigned to KANURI RAJESH (1)· patent assignee history
2012Patents assigned to MENEZES MARLON E (1)· patent assignee history
2012Patents assigned to PARIHAR VIJAY (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC42009–2012
BENCHER CHRISTOPHER DENNIS12012
KANURI RAJESHself12012
MENEZES MARLON E12012
PARIHAR VIJAY12012
Locations
LocationPatentsSpan
Santa Clara, California, US42009–2012