Inventor

Akio Ashida

Inventor
Tokyo, JP

Overview

4→
Patents
1997–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B28Dprimary
B28DWorking stone or stone-like materials20%
C10MLubricating compositions13%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
B01DSeparation7%
B24BMachines, devices, or processes for grinding or polishing7%
C02FTreatment of water, waste water, sewage, or sludge7%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
Y10TTechnical subjects covered by former us classification7%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2001Patents assigned to SHINETSU HANDOTAI KK (3)· patent assignee history
1997–2002Based in Tokyo, JP· patent location history
1999–2002Patents assigned to OHTOMO CHEMICAL IND CORP (3)· patent assignee history
1999Patents assigned to HITACHI ZOSEN METAL WORKS CO L (1)· patent assignee history
1999Patents assigned to MIMASU SEMICONDUCTOR IND CO (1)· patent assignee history
2002Patents assigned to SUPER SILICON CRYSTAL RES INST (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
OHTOMO CHEMICAL IND CORP31999–2002
SHINETSU HANDOTAI KK31997–2001
HITACHI ZOSEN METAL WORKS CO L11999
MIMASU SEMICONDUCTOR IND CO11999
SUPER SILICON CRYSTAL RES INST12002
Locations
LocationPatentsSpan
Tokyo, JP41997–2002