Inventor

Hirotama Fujimaru

Inventor

Himeji, JP

Overview

2000–2015

Patent span

Chemistry

Primary field (CPC C)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds29%

A61LMethods or apparatus for sterilising materials or objects in general16%

C08JWorking-up16%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry9%

Y10TTechnical subjects covered by former us classification7%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%

C08LCompositions of macromolecular compounds4%

A61FFilters implantable into blood vessels3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

A01GHorticulture1%

PatentTitleYear

9,187,579'Particle-shaped water absorbing agent and method for producing the same'2015 9,062,140'Polyacrylic acid (salt) water-absorbent resin, production process thereof, and acrylic acid used in polymerization for production of water-absorbent resin'2015 8,822,373'Particulate water absorbing agent and production method thereof'2014 8,765,857'Particulate water retaining material for cultivating plant having water absorbent resin as main component'2014 8,729,191'Production process of polyacrylic acid (salt) water-absorbent resin'2014 8,552,134'Method of producing polyacrylic acid (salt) water-absorbent resin'2013 8,481,664'Particulate water absorbing agent including polyacrylic acid (polyacrylate) based water absorbing resin as a principal component, method for production thereof, water-absorbent core and absorbing article in which the particulate water absorbing agent is used'2013 7,435,477'Particulate water absorbent containing water absorbent resin as a main component'2008 7,282,262'Particulate water absorbent containing water absorbent resin as a main component'2007 7,196,139'Water-absorbent resin composition'2007 7,049,366'Acrylic acid composition and its production process, and process for producing water-absorbent resin using this acrylic acid composition, and water-absorbent resin'2006 6,822,010'Method for production of porous material'2004 6,797,735'Process for producing porous polymer'2004 6,730,711'Method for production of porous cross-linked polymer material'2004 6,727,345'Continuous production process for water-absorbent resin powder and powder surface detector used therefor'2004 6,716,894'Water-absorbent resin powder and its production process and uses'2004 6,630,519'Process for producing porous polymer'2003 6,444,744'Hydrophilic resin, absorbent article, and acrylic acid for polymerization'2002 6,395,792'Method for production of porous cross-linked poymer'2002 6,395,793'Method for production of porous material'2002 6,323,250'Method for production of porous material'2001 6,274,638'Method for production of porous cross-linked polymer material'2001 6,187,872'Water-absorbent agent and method for manufacturing the same'2001 6,184,433'Pressure-resistant absorbent resin, disposable diaper using the resin, and absorbent resin, and method for production thereof'2001 6,166,097'Method for production of porous material'2000 6,110,984'Water-swellable crosslinked polymer, production process therefor, and measurement method for pore volume of swollen crosslinked polymer'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2015Patents assigned to NIPPON CATALYTIC CHEM IND (26)· patent assignee history

2000–2015Based in Himeji, JP· patent location history

2000–2002Based in Suita, JP· patent location history

2001–2015Based in Hyogo, JP· patent location history

2007–2008Based in Kishiwada, JP· patent location history

2013–2015Patents assigned to FUJIMARU HIROTAMA (7)· patent assignee history

2013–2015Patents assigned to ISHIZAKI KUNIHIKO (5)· patent assignee history

2013–2014Patents assigned to DAIROKU YORIMICHI (2)· patent assignee history

2013–2014Based in Osaka, JP· patent location history

2014–2015Patents assigned to IKEUCHI HIROYUKI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIPPON CATALYTIC CHEM IND	26	2000–2015
FUJIMARU HIROTAMAself	7	2013–2015
ISHIZAKI KUNIHIKO	5	2013–2015
DAIROKU YORIMICHI	2	2013–2014
IKEUCHI HIROYUKI	2	2014–2015

Locations

Location	Patents	Span
Himeji, JP	14	2000–2015
Suita, JP	6	2000–2002
Hyogo, JP	2	2001–2015
Osaka, JP	2	2013–2014
Kishiwada, JP	2	2007–2008