Inventor
CHRISTIAN DUSSARRAT
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material26%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium16%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%
C07CAcyclic or carbocyclic compounds5%
H01LSemiconductor devices5%
C01BNon-metallic elements3%
C01DCompounds of alkali metals, i.e. lithium, sodium, potassium, rubidium, caesium, or francium3%
PatentTitleYear
12,577,662Tin-containing precursors for deposition of tin-containing thin films and their corresponding deposition processes202612,497,691Devices having a rare earth (oxy) fluoride coating for improved resistance to corrosive chemical environments and methods for making and using these devices202512,489,104Processes for forming metal oxide thin films on electrode interphase control202512,435,413Indium compound and method for forming indium-containing film using said indium compounds202512,404,585Lithium precursors for deposition of lithium-containing layers, islets or clusters202512,368,152Compound and method for producing lithium-containing film202512,065,453Lanthanoid compound, lanthanoid-containing thin film and formation of lanthanoid-containing thin film using the lanthanoid compound202411,859,283Heteroalkylcyclopentadienyl indium-containing precursors and processes of using the same for deposition of indium-containing layers202411,549,182Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films202311,162,175Group 6 transition metal-containing compounds for vapor deposition of group 6 transition metal-containing films202111,152,223Fluorocarbon molecules for high aspect ratio oxide etch2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to AIR LIQUIDE (10)· patent assignee history
2021Patents assigned to AIR LIQUIDE AMERICAN (1)· patent assignee history
2021Patents assigned to LAIR LIQUIDE SOC POUR IETUDE ET IEXPLOITATION DES PROCEDES GEORGES CLAUDE (1)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIR LIQUIDE | 10 | 2021–2026 |
| AIR LIQUIDE AMERICAN | 1 | 2021 |
| LAIR LIQUIDE SOC POUR IETUDE ET IEXPLOITATION DES PROCEDES GEORGES CLAUDE | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2026 |