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Inventor

Youichi Nakayama

Inventor
Nirasaki, JP

Overview

5→
Patents
2007–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G05BControl or regulating systems in general17%
H01LSemiconductor devices17%
Y02PClimate change mitigation technologies in the production or processing of goods17%
C23CCoating metallic material8%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
9,766,617'Substrate processing apparatus'20179,070,728'Method of lowering temperature of substrate table, computer-readable storage medium, and substrate processing system'20158,612,038'Target object processing system and method of controlling the same'20137,692,916'Capacitive coupling plasma processing apparatus and method'20107,266,418'Substrate processing apparatus, history information recording method, history information recording program, and history information recording system'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2017Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2007–2017Based in Nirasaki, JP· patent location history
2013–2015Patents assigned to KOBAYASHI KENICHI (2)· patent assignee history
2013–2015Patents assigned to NAKAYAMA YOUICHI (2)· patent assignee history
2013Patents assigned to SHIKI KEIICHIRO (1)· patent assignee history
2013Based in Yamanashi, JP· patent location history
2015Patents assigned to KAI KOZO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD52007–2017
KOBAYASHI KENICHI22013–2015
NAKAYAMA YOUICHIself22013–2015
KAI KOZO12015
SHIKI KEIICHIRO12013
Locations
LocationPatentsSpan
Nirasaki, JP42007–2017
Yamanashi, JP12013