Inventor
Yuri Johannes Gabriël Van De Vijver
Inventor
Best, NL
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%
H05GX-ray technique11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B82YSpecific uses or applications of nanostructures6%
G02BOptical elements, systems or apparatus6%
H05KPrinted circuits6%
G01BMeasuring length, thickness or similar linear dimensions3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
PatentTitleYear
10,705,426Extraction body for lithographic apparatus202010,571,810Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus202010,534,270Lithography apparatus, a method of manufacturing a device and a control program202010,317,804Substrate table, lithographic apparatus and method of operating a lithographic apparatus201910,310,394Lithographic apparatus, a projection system and a device manufacturing method201910,261,422Lithography apparatus and method of manufacturing a device20199,971,254Sensor, lithographic apparatus and device manufacturing method20189,753,382'Sensor, lithographic apparatus and device manufacturing method'20179,363,879'Module and method for producing extreme ultraviolet radiation'20168,901,521'Module and method for producing extreme ultraviolet radiation'20148,797,504'Lithographic apparatus and device manufacturing method'20148,749,756'Lithographic apparatus and device manufacturing method'20148,730,448'Lithographic apparatus and device manufacturing method'20148,711,325'Method and system for determining a suppression factor of a suppression system and a lithographic apparatus'20148,220,315'Gas gauge, lithographic apparatus and device manufacturing method'20128,115,900'Lithographic apparatus and device manufacturing method'20128,094,287'Lithographic appararus and method'20127,476,491'Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby'20097,446,849'Lithographic apparatus and device manufacturing method'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history
2008–2020Based in Best, NL· patent location history
2012–2014Patents assigned to LABETSKI DZMITRY (5)· patent assignee history
2012–2014Patents assigned to VAN EMPEL TJARKO ADRIAAN RUDOLF (5)· patent assignee history
2012–2014Patents assigned to VAN SCHOOT JAN BERNARD PLECHELMUS (5)· patent assignee history
2012–2014Patents assigned to SCHIMMEL HENDRIKUS GIJSBERTUS (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 19 | 2008–2020 |
| LABETSKI DZMITRY | 5 | 2012–2014 |
| VAN EMPEL TJARKO ADRIAAN RUDOLF | 5 | 2012–2014 |
| VAN SCHOOT JAN BERNARD PLECHELMUS | 5 | 2012–2014 |
| SCHIMMEL HENDRIKUS GIJSBERTUS | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Best, NL | 19 | 2008–2020 |