Inventor

Klaus Elian

Inventor
Alteglofsheim, DE

Overview

71→
Patents
2001–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 71 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H01LSemiconductor devices9%
G01RMeasuring electric variables8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
B81BMicrostructural devices or systems, e.g. micromechanical devices5%
H10NElectric solid-state devices not otherwise provided for5%
Y10TTechnical subjects covered by former us classification5%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
B82YSpecific uses or applications of nanostructures3%
PatentTitleYear
10,852,363Side-biased current sensor with improved dynamic range202010,802,124Sonic sensors and packages202010,571,682Tilted chip assembly for optical devices202010,543,722Flexible tire sensor device and method202010,539,779Tilted chip assembly for optical devices202010,519,030Transducer package with integrated sealing201910,515,879Package with component connected at carrier level201910,505,102Semiconductor device for sensing a magnetic field including an encapsulation material defining a through-hole201910,451,543Integrated photo-acoustic gas sensor module201910,310,026Bias field generation for a magneto sensor201910,118,816Method of forming a protective coating for a packaged semiconductor device201810,107,867Sensor arrangement, battery cell and energy system201810,107,875GMR sensor within molded magnetic material employing non-magnetic spacer20189,998,812Surface mountable microphone package, a microphone arrangement, a mobile phone and a method for recording microphone signals20189,927,498'Magnetic sensor device comprising a ring-shaped magnet and a sensor chip in a common package'20189,911,966'Battery cell'20189,872,111'Acoustic sensor package'20189,817,079'Molded sensor package with an integrated magnet and method of manufacturing molded sensor packages with an integrated magnet'20179,818,665'Method of packaging a semiconductor chip using a 3D printing process and semiconductor package having angled surfaces'20179,748,611'Apparatus for determining a state of a rechargeable battery or of a battery, a rechargeable battery or a battery, and a method for determining a state of a rechargeable battery or of a battery'20179,728,652'Sensor device and method'20179,678,170'Bias field generation for a magneto sensor'20179,631,997'Apparatus for measuring a pressure, a method for manufacturing an apparatus for measuring a pressure and a battery'20179,601,858'Magnet package and method for producing a magnet package'20179,561,953'Method of forming a protective coating for a packaged semiconductor device'20179,557,417'Sonic sensors and packages'20179,536,953'Method for making a sensor device using a graphene layer'20179,432,759'Surface mountable microphone package, a microphone arrangement, a mobile phone and a method for recording microphone signals'20169,332,330'Surface mountable microphone package, a microphone arrangement, a mobile phone and a method for recording microphone signals'20169,297,669'Bias field generation for a magneto sensor'20169,257,724'Reaction chamber arrangement and a method for forming a reaction chamber arrangement'20169,239,386'Sonic sensors and packages'20169,209,497'Sensor module and battery elements'20159,201,123'Magnetic sensor device and a method for fabricating the same'20159,164,156'Apparatus having a back-bias magnet and a semiconductor chip element'20159,153,706'Film-covered open-cavity sensor package'20159,153,369'Bias field generator including a body having two body parts and holding a packaged magnetic sensor'20159,121,885'Sensor package and method of manufacturing thereof'20159,121,880'Magnetic sensor device'20159,070,615'Method for making a sensor device using a graphene layer'20158,952,489'Semiconductor package and method for fabricating the same'20158,841,785'Energy harvester'20148,759,153'Method for making a sensor device using a graphene layer'20148,729,697'Sensor arrangement, a measurement circuit, chip-packages and a method for forming a sensor arrangement'20148,722,462'Semiconductor package'20148,652,866'Sensor device and method'20148,610,430'Bias field generation for a magneto sensor'20138,513,771'Semiconductor package with integrated inductor'20138,373,240'Sensor device having a structure element'20138,362,579'Semiconductor device including a magnetic sensor chip'20138,289,019'Sensor'20128,278,727'Pressure sensor and method'20128,253,210'Semiconductor device including a magnetic sensor chip'20128,227,177'Method for multiple irradiation of a resist'20128,124,953'Sensor device having a porous structure element'20127,964,448'Electronic device and method of manufacturing same'20117,928,011'Method for structuring a substrate using a metal mask layer formed using a galvanization process'20117,793,550'Sensor device including two sensors embedded in a mold material'20107,462,442'Biocompatible microchip and a method for producing the same'20087,374,858'Polymerizable compositions; polymer, resist, and lithography method'20087,351,518'Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer'20087,220,531'Resist for electron beam lithography and a process for producing photomasks using electron beam lithography'20077,160,670'Resist for forming a structure for aligning an electron or ion beam and technique for forming the structure'20077,157,189'Lithographic process for reducing the lateral chromium structure loss in photomask production using chemically amplified resists'20077,125,653'Method of producing conductive or semiconducting structured polymers'20067,005,220'Method for structuring a lithography mask'20066,821,706'Polymerizable composition, polymer, resist, and process for electron beam lithography'20046,703,190'Method for producing resist structures'20046,686,131'Method of producing biocompatible structures and biocompatible microchip'20046,251,558'Chemically amplified resist'20016,171,755'Chemically amplified resist'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2020Patents assigned to INFINEON TECHNOLOGIES AG (66)· patent assignee history
2001–2008Based in Erlangen, DE· patent location history
2007–2012Based in Bubenreuth, DE· patent location history
2010–2020Based in Alteglofsheim, DE· patent location history
2012–2018Patents assigned to ELIAN KLAUS (21)· patent assignee history
2012–2018Patents assigned to THEUSS HORST (13)· patent assignee history
2012–2013Patents assigned to MEYER-BERG GEORG (3)· patent assignee history
2012–2018Patents assigned to KOLLER ADOLF (2)· patent assignee history
2017Based in Regensburg, DE· patent location history
2017Based in Alteglofshein, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG662001–2020
ELIAN KLAUSself212012–2018
THEUSS HORST132012–2018
MEYER-BERG GEORG32012–2013
KOLLER ADOLF22012–2018
Locations
LocationPatentsSpan
Alteglofsheim, DE542010–2020
Erlangen, DE112001–2008
Bubenreuth, DE32007–2012
Regensburg, DE12017
Alteglofshein, DE12017