Inventor

Masateru Suwa

Inventor
Ibaraki, JP

Overview

21→
Patents
1976–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C22Cprimary
C22CAlloys22%
F01DNon-positive displacement machines or engines, e.g. steam turbines12%
C21DModifying the physical structure of ferrous metals10%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
B23KSoldering or unsoldering6%
H01JElectric discharge tubes or discharge lamps4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
Y10TTechnical subjects covered by former us classification4%
B22FWorking metallic powder2%
PatentTitleYear
6,224,334'Steam turbine, rotor shaft thereof, and heat resisting steel'20015,740,668'High efficiency gas turbine'19985,624,235'Steam turbine, rotor shaft thereof, and heat resisting steel'19975,569,338'Steam turbine rotor shaft thereof and heat resisting steel'19965,536,146'Combined generator system'19965,383,768'Steam turbine, rotor shaft thereof, and heat resisting steel'19955,296,057'High abrasion resistant aluminum bronze alloy, and sliding members using same'19945,203,984'Monitoring system for plant operation condition and its in-situ electrochemical electrode'19935,153,704'Semiconductor device using annealed bonding wire'19924,973,366'Insert material for solid phase diffusion welding for nickel base superalloy and method therefor'19904,939,762'Target for X-ray tube as well as method of manufacturing the same, and X-ray tube'19904,912,544'Corrosion-resistant aluminum electronic material'19904,692,230'Thin film forming method through sputtering and sputtering device'19874,383,970'Process for preparation of graphite-containing aluminum alloys'19834,246,693'Method of fabricating semiconductor device by bonding together silicon substrate and electrode or the like with aluminum'19814,236,925'Method of producing sintered material having high damping capacity and wearing resistance and resultant products'19804,207,096'Method of producing graphite-containing copper alloys'19804,110,783'Solder layer for a semi-conductor device consisting of at least one group V element, at least one rare element and aluminum'19784,084,669'Composite collector'19784,025,336'Aluminum bronze having a good wear resistance'19773,969,754'Semiconductor device having supporting electrode composite structure of metal containing fibers'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–2001Patents assigned to HITACHI LTD (20)· patent assignee history
1976–1978Based in Hitachi, JP· patent location history
1980–1983Based in Tokai, JP· patent location history
1981–2001Based in Ibaraki, JP· patent location history
1983Patents assigned to HITACHI CHEMICAL CO LTD (1)· patent assignee history
1990Patents assigned to AGENCY IND SCIENCE TECHN (1)· patent assignee history
1990Patents assigned to HITACHI MEDICAL CORP (1)· patent assignee history
1993Based in Tohkai, JP· patent location history
1998Based in Hitachinaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD201976–2001
AGENCY IND SCIENCE TECHN11990
HITACHI CHEMICAL CO LTD11983
HITACHI MEDICAL CORP11990
Locations
LocationPatentsSpan
Ibaraki, JP101981–2001
Tokai, JP31980–1983
Hitachi, JP31976–1978
Hitachinaka, JP11998
Tohkai, JP11993