Inventor
Hougong Wang
Inventor
Pleasanton, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01JElectric discharge tubes or discharge lamps14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
Y10TTechnical subjects covered by former us classification12%
C25DProcesses for the electrolytic or electrophoretic production of coatings5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
C22CAlloys2%
F01DNon-positive displacement machines or engines, e.g. steam turbines2%
H01FMagnets2%
PatentTitleYear
10,622,145Magnetic thin film deposition chamber and thin film deposition apparatus202010,381,202Magnetron and magnetron sputtering device201910,287,686Hot plate and substrate processing equipment using the same20198,747,556'Apparatuses and methods for atomic layer deposition'20148,293,015'Apparatuses and methods for atomic layer deposition'20127,884,032'Thin film deposition'20117,006,888'Semiconductor wafer preheating'20066,913,680'Method of application of electrical biasing to enhance metal deposition'20056,672,864'Method and apparatus for processing substrates in a system having high and low pressure areas'20046,610,189'Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature'20036,303,994'Method and apparatus for reducing the first wafer effect'20016,299,689'Reflow chamber and process'20016,139,698'Method and apparatus for reducing the first wafer effect'20006,077,404'Reflow chamber and process'20006,077,402'Central coil design for ionized metal plasma deposition'20005,976,695'Thermally sprayable powder materials having an alloyed metal phase and a solid lubricant ceramic phase and abradable seal assemblies manufactured therefrom'19995,879,523'Ceramic coated metallic insulator particularly useful in a plasma sputter reactor'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2014Patents assigned to APPLIED MATERIALS INC (12)· patent assignee history
1999–2001Based in Cupertino, CA, US· patent location history
2003–2014Based in Pleasanton, CA, US· patent location history
2012–2019Patents assigned to WANG HOUGONG (3)· patent assignee history
2012–2014Patents assigned to AI HUA (2)· patent assignee history
2012–2014Patents assigned to JACKSON MICHAEL (2)· patent assignee history
2019–2020Patents assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (3)· patent assignee history
2019–2020Based in Beijing, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 12 | 1999–2014 |
| BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD | 3 | 2019–2020 |
| WANG HOUGONGself | 3 | 2012–2019 |
| AI HUA | 2 | 2012–2014 |
| JACKSON MICHAEL | 2 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pleasanton, California, US | 7 | 2003–2014 |
| Cupertino, California, US | 7 | 1999–2001 |
| Beijing, CN | 3 | 2019–2020 |