Inventor
Tetsuya Hatai
Inventor
Fukuyama, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10DInorganic electric semiconductor devices20%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation20%
PatentTitleYear
7,867,810'Method for manufacturing a solid-state image capturing apparatus'20117,704,652'Exposure operation evaluation method for exposure apparatus and manufacturing method for semiconductor device'20106,103,428'Photomask utilizing auxiliary pattern that is not transferred with the resist pattern'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2011Patents assigned to SHARP KK (3)· patent assignee history
2000Based in Tenri, JP· patent location history
2010Based in Hukuyama, JP· patent location history
2011Based in Fukuyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHARP KK | 3 | 2000–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fukuyama, JP | 1 | 2011 |
| Hukuyama, JP | 1 | 2010 |
| Tenri, JP | 1 | 2000 |