Inventor
MASAHIKO SHIMADA
Inventor
JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
C07CAcyclic or carbocyclic compounds15%
C07DHeterocyclic compounds15%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
B60QArrangement of signalling or lighting devices, the mounting or supporting thereof or circuits therefor, for vehicles in general8%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for6%
B60KArrangement or mounting of propulsion units or of transmissions in vehicles2%
B60WConjoint control of vehicle sub-units of different type or different function2%
B62DMotor vehicles2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium2%
PatentTitleYear
12,578,639Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern202612,572,072Salt, acid generator, resin, resist composition and method for producing resist pattern202612,572,071Carboxylate, carboxylic acid generator, resin, resist composition and method for producing resist pattern202612,529,957Salt, acid generator, resin, resist composition and method for producing resist pattern202612,278,066Lever switch mounted on vehicle202512,222,648Salt, acid generator, resist composition and method for producing resist pattern202512,124,167Carboxylate, resist composition and method for producing resist pattern202412,020,466Computer-readable recording medium, training data generation method, and training data generation apparatus202412,013,636Salt, acid generator, resist composition and method for producing resist pattern202411,685,305Vehicular light switch and vehicular light system202311,640,114Compound, resin, photoresist composition and process for producing photoresist pattern202311,453,329Vehicular light switch and vehicular light system202211,358,607Vehicle control device202211,327,399Photoresist composition and process for producing photoresist pattern2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SUMITOMO CHEMICAL CO (9)· patent assignee history
2022–2023Patents assigned to HONDA MOTOR CO LTD (3)· patent assignee history
2022–2026Based in JP· patent location history
2024Patents assigned to FUJITSU LTD (1)· patent assignee history
2025Patents assigned to TOYO DENSO KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 9 | 2022–2026 |
| HONDA MOTOR CO LTD | 3 | 2022–2023 |
| FUJITSU LTD | 1 | 2024 |
| TOYO DENSO KK | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 14 | 2022–2026 |