Inventor

Yoshihiro Kamimura

Inventor

Tokyo, JP

Overview

2003–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C01Bprimary

C01BNon-metallic elements17%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry13%

G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure13%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds10%

C30BSingle-crystal growth10%

B01DSeparation3%

B60TVehicle brake control systems or parts thereof3%

F04BPositive-displacement machines for liquids3%

F04CRotary-piston, or oscillating-piston, positive-displacement machines for liquids3%

G01DMeasuring not specially adapted for a specific variable3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2003–2021Patents assigned to NIPPON SEIKI CO LTD (4)· patent assignee history

2003–2016Based in Niigata, JP· patent location history

2012–2020Patents assigned to UNIV TOKYO (5)· patent assignee history

2012–2017Patents assigned to ITABASHI KEIJI (3)· patent assignee history

2012–2017Patents assigned to KAMIMURA YOSHIHIRO (3)· patent assignee history

2012–2020Based in Tokyo, JP· patent location history

2014–2020Patents assigned to UNIZEO CO LTD (4)· patent assignee history

2021Based in Nagaoka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations