Inventor
HAKUBA KITAGAWA
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H10BElectronic memory devices16%
H10DInorganic electric semiconductor devices12%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
B05CApparatus for applying fluent materials to surfaces, in general4%
B08BCleaning in general4%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
C23FNon-mechanical removal of metallic material from surface4%
PatentTitleYear
12,532,515Semiconductor substrate, method of manufacturing semiconductor device, and method of manufacturing semiconductor substrate202612,243,751Chemical solution, etching method, and method for manufacturing semiconductor device202511,784,064Substrate treatment apparatus and manufacturing method of semiconductor device202311,616,120Semiconductor substrate, method of manufacturing semiconductor device, and method of manufacturing semiconductor substrate202311,342,182Substrate treatment device, substrate treatment method, and semiconductor device manufacturing method202211,211,267Substrate processing apparatus and substrate processing method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to TOSHIBA MEMORY CORP (1)· patent assignee history
2021–2026Based in JP· patent location history
2022–2026Patents assigned to KIOXIA CORP (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KIOXIA CORP | 5 | 2022–2026 |
| TOSHIBA MEMORY CORP | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2021–2026 |