Inventor

Shuichi Iwado

Inventor

Fukuyama, JP

Overview

1986–1995

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C10Mprimary

C10MLubricating compositions33%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions29%

C22CAlloys10%

C25DProcesses for the electrolytic or electrophoretic production of coatings10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

Y10TTechnical subjects covered by former us classification10%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1986–1995Patents assigned to NIPPON KOKAN KK (9)· patent assignee history

1986–1987Patents assigned to KAO CORP (5)· patent assignee history

1986–1987Based in Fukuyama, JP· patent location history

1989Patents assigned to YUSHIRO CHEM IND (1)· patent assignee history

1989Based in Okayama, JP· patent location history

1994–1995Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations