Inventor
Toshiya Shimada
Inventor
Toyama, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H01JElectric discharge tubes or discharge lamps9%
A61KPreparations for medical, dental or toiletry purposes6%
A61QSpecific use of cosmetics or similar toiletry preparations6%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H05HPlasma technique6%
B08BCleaning in general3%
B29BPreparation or pretreatment of the material to be shaped3%
PatentTitleYear
10,763,084Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus202010,403,478Plasma processing apparatus and method of manufacturing semiconductor device20199,911,580'Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus'20189,082,797'Substrate processing apparatus and method of manufacturing semiconductor device'20157,691,413'Composite particle and process for producing the same'20106,410,605'Process for preparing emulsion'20025,613,848'Process for the production of glass-like carbon substrates for use as recording media and a setter for use in the process'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2010Patents assigned to KAO CORP (3)· patent assignee history
1997–2010Based in Wakayama, JP· patent location history
2015–2020Patents assigned to HITACHI INT ELECTRIC INC (4)· patent assignee history
2015–2018Patents assigned to AMANO TOMIHIRO (2)· patent assignee history
2015–2018Patents assigned to HIYAMA SHIN (2)· patent assignee history
2015–2020Based in Toyama, JP· patent location history
2019–2020Patents assigned to KOKUSAI ELECTRIC CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 4 | 2015–2020 |
| KAO CORP | 3 | 1997–2010 |
| AMANO TOMIHIRO | 2 | 2015–2018 |
| HIYAMA SHIN | 2 | 2015–2018 |
| KOKUSAI ELECTRIC CORP | 2 | 2019–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 4 | 2015–2020 |
| Wakayama, JP | 3 | 1997–2010 |