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Inventor

Peter David Engblom

Inventor
Portland, OR, US

Overview

5→
Patents
2016–2021
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
G01BMeasuring length, thickness or similar linear dimensions25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
10,901,330Recipe selection based on inter-recipe consistency202110,394,137Inspection method, lithographic apparatus, mask and substrate201910,338,484Recipe selection based on inter-recipe consistency201910,001,711Inspection method, lithographic apparatus, mask and substrate20189,280,064'Lithographic method and apparatus'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2021Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2016Patents assigned to DE WINTER LAURENTIUS CORNELIUS (1)· patent assignee history
2016Patents assigned to ENGBLOM PETER DAVID (1)· patent assignee history
2016Patents assigned to KÖHLER CARSTEN ANDREAS (1)· patent assignee history
2016Patents assigned to STAALS FRANK (1)· patent assignee history
2016Based in Meridian, ID, US· patent location history
2018–2019Based in Hillsboro, OR, US· patent location history
2019–2021Based in Portland, OR, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52016–2021
DE WINTER LAURENTIUS CORNELIUS12016
ENGBLOM PETER DAVIDself12016
KÖHLER CARSTEN ANDREAS12016
STAALS FRANK12016
Locations
LocationPatentsSpan
Portland, OR, US22019–2021
Hillsboro, OR, US22018–2019
Meridian, ID, US12016