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Inventor

Xuchu Jiang

Inventor
Shanghai, CN

Overview

1→
Patents
2017
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
9,760,025'Reticle shape regulation device and method, and exposure apparatus using same'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD (1)· patent assignee history
2017Patents assigned to SHANGHAI MICROELECTRONICS EQUI (1)· patent assignee history
2017Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO LTD12017
SHANGHAI MICROELECTRONICS EQUI12017
Locations
LocationPatentsSpan
Shanghai, CN12017