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Inventor

Samuel Kalt

Inventor
Reutlingen, DE

Overview

3→
Patents
1999–2011
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H01JElectric discharge tubes or discharge lamps25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
8,039,813'Charged particle-optical systems, methods and components'20116,004,700'Membrane mask for electron beam lithography'19995,935,739'Manufacturing method for membrane lithography mask with mask fields'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to IBM (2)· patent assignee history
1999–2011Based in Reutlingen, DE· patent location history
2011Patents assigned to APPLIED MATERIALS ISRAEL LTD (1)· patent assignee history
2011Patents assigned to ZEISS CARL SMT GMBH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM21999
APPLIED MATERIALS ISRAEL LTD12011
ZEISS CARL SMT GMBH12011
Locations
LocationPatentsSpan
Reutlingen, DE31999–2011