Inventor
Seung-hune Yang
Inventor
Taichung, TW
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
G02BOptical elements, systems or apparatus15%
H01JElectric discharge tubes or discharge lamps10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
B82YSpecific uses or applications of nanostructures8%
G01BMeasuring length, thickness or similar linear dimensions3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
G06TImage data processing or generation, in general3%
PatentTitleYear
10,996,444Photographing optical lens assembly, imaging apparatus and electronic device202110,955,643Electronic device with projection device, detecting module and lens system202110,935,766Optical photographing lens assembly, imaging apparatus and electronic device202110,928,609Optical imaging lens assembly, image capturing apparatus and electronic device202110,901,183Optical photographing lens assembly, image capturing unit and electronic device202110,901,180Lens system, projection device, detecting module and electronic device202110,126,646Method of calculating a shift value of a cell contact20189,703,189'Method of calculating a shift vale of a cell contact'20179,542,740'Method for detecting defect in pattern'20178,677,288'Test pattern selection method for OPC model calibration'20148,614,034'Method of manufacturing photo-mask'20137,185,312'Exposure method for correcting line width variation in a photomask'20077,061,582'Exposure apparatus including micro mirror array and exposure method using the same'20066,783,905'Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof'20046,775,815'Exposure method for correcting line width variation in a photomask'20046,641,979'Technique of exposing a resist using electron beams having different accelerating voltages'20036,627,366'Electron beam exposure method having good linearity with respect to producing fine patterns'20036,555,275'Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2018Patents assigned to SAMSUNG ELECTRONICS CO LTD (12)· patent assignee history
2003Based in Yongin, KR· patent location history
2004–2007Based in Kyungki-do, KR· patent location history
2006Based in Sungnam, KR· patent location history
2013–2014Patents assigned to MOON SEONG-HO (2)· patent assignee history
2013–2014Patents assigned to SHAMSUAROV ARTEM (2)· patent assignee history
2013–2014Patents assigned to YANG SEUNG-HUNE (2)· patent assignee history
2013–2018Based in Seoul, KR· patent location history
2021Patents assigned to LARGAN PRECISION CO LTD (6)· patent assignee history
2021Based in Taichung, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 12 | 2003–2018 |
| LARGAN PRECISION CO LTD | 6 | 2021 |
| MOON SEONG-HO | 2 | 2013–2014 |
| SHAMSUAROV ARTEM | 2 | 2013–2014 |
| YANG SEUNG-HUNEself | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taichung, TW | 6 | 2021 |
| Seoul, KR | 5 | 2013–2018 |
| Yongin, KR | 3 | 2003 |
| Kyungki-do, KR | 2 | 2004–2007 |
| Sungnam, KR | 1 | 2006 |